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Inventor profile of:

Florian Bach

City:

Oberkochen

Country:

Germany

Published Applications:

Last publication date:

2018-08-30

Top Assignees for applications by Florian Bach

The entities that hold a legal rights for patent applications filed by inventor Bach Florian:

Carl Zeiss SMT GmbH 17 Oberkochen, Germany
CARL ZEISS SMT AG 4 Oberkochen, Germany

Recent patent applications by Bach Florian

Florian Bach from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-08-30

US20180246415A1

Physics

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

#2 | 2016-10-27

US20160313646A1

Physics

Facet mirror for use in a projection exposure apparatus for microlithography

#3 | 2016-09-15

US20160266502A1

Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#4 | 2015-10-22

US20150300807A1

Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#5 | 2014-11-13

US20140333912A1

Physics

Microlithographic projection exposure apparatus

#6 | 2014-10-16

US20140307239A1

Physics

Illumination system of a microlithographic projection exposure apparatus having a temperature control device

#7 | 2014-08-21

US20140233006A1

Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#8 | 2014-08-14

US20140226141A1

Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#9 | 2014-08-07

US20140218708A1

Physics

Light modulator and illumination system of a microlithographic projection exposure apparatus

#10 | 2013-11-28

US20130314681A1

Physics

Arrangement for mounting an optical element

#11 | 2012-11-22

US20120293784A1

Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#12 | 2011-11-10

US20110273694A1

Physics

Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography

#13 | 2011-07-28

US20110181852A1

Physics

Microlithographic projection exposure apparatus

#14 | 2011-07-28

US20110181850A1

Physics

Illumination system of a microlithographic projection exposure apparatus having a temperature control device

#15 | 2011-01-06

US20110001947A1

Physics

Facet mirror for use in a projection exposure apparatus for microlithography

#16 | 2010-10-14

US20100261120A1

Physics

Mirror for guiding a radiation bundle

#17 | 2010-02-18

US20100039629A1

Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#18 | 2009-01-01

US20090002668A1

Physics

Method and device for controlling a plurality of actuators and an illumination device for lithography

InventorID:

545667 ⎘