Fei Sun

City:

Hefei

Country:

China

Published Applications:

Last publication date:

2023-01-26

Top Assignees for applications by Fei Sun

The entities that hold a legal rights for patent applications filed by inventor Sun Fei:

Fei Sun from Hefei, CN has applied for patents for these inventions. The list has both pending applications and granted patents:

CLEANING MACHINE AND CLEANING METHOD OF PHOTOMASK PELLICLE

Photomask protection device, photomask protection system, and use method of photomask protection system

InventorID:

5501336 ⎘