Seoul
South Korea
23
2026-04-09
The entities that hold a legal rights for patent applications filed by inventor Lee JooHo:
JooHo Lee from Seoul, KR has applied for patents for these inventions. The list has both pending applications and granted patents:
METAL CHLORIDE PRECURSORS AND DEPOSITION OF METAL-CONTAINING FILMS
#2 | 2025-12-04METHOD OF FORMING DIELECTRIC FILMS, NEW PRECURSORS AND THEIR USE IN THE SEMI-CONDUCTOR MANUFACTURING
#3 | 2025-07-10GROUP 2 METAL CONTAINING FILM FORMING COMPOSITIONS AND VAPOR DEPOSITION OF THE FILMS USING THE SAME
#4 | 2023-10-12NIOBIUM, VANADIUM, TANTALUM FILM FORMING COMPOSITIONS AND DEPOSITION OF GROUP V (FIVE) CONTAINING FILMS USING THE SAME
#5 | 2023-10-05METHOD OF FORMING DIELECTRIC FILMS, NEW PRECURSORS AND THEIR USE IN THE SEMI-CONDUCTOR MANUFACTURING
#6 | 2022-06-30GROUP IV ELEMENT CONTAINING PRECURSORS AND DEPOSITION OF GROUP IV ELEMENT CONTAINING FILMS
#7 | 2022-04-21Step coverage using an inhibitor molecule for high aspect ratio structures
#8 | 2021-08-12Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films
#9 | 2021-06-24Area selective deposition of metal containing films
#10 | 2021-06-24GROUP V ELEMENT-CONTAINING FILM FORMING COMPOSITIONS AND VAPOR DEPOSITION OF GROUP V ELEMENT-CONTAINING FILM
#11 | 2019-12-05Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films
#12 | 2018-11-15Etching reactants and plasma-free etching processes using the same
#13 | 2018-04-19Declarative configuration and execution of card content management operations for trusted service manager
#14 | 2017-10-19Niobium-containing film forming compositions and vapor deposition of Niobium-containing films
#15 | 2017-06-01Niobium-Nitride film forming compositions and vapor deposition of Niobium-Nitride films
#16 | 2017-01-19HETEROLEPTIC DIAZADIENYL GROUP 4 TRANSITION METAL-CONTAINING COMPOUNDS FOR VAPOR DEPOSITION OF GROUP 4 TRANSITION METAL-CONTAINING FILMS
#17 | 2016-09-01Group 5 transition metal-containing compounds for vapor deposition of group 5 transition metal-containing films
#18 | 2016-03-24TANTALUM- OR VANADIUM-CONTAINING FILM FORMING COMPOSITIONS AND VAPOR DEPOSITION OF TANTALUM- OR VANADIUM-CONTAINING FILMS
#19 | 2015-08-27Declarative configuration and execution of card content management operations for trusted service manager
#20 | 2015-03-12TITANIUM BIS DIAZADIENYL PRECURSOR FOR VAPOR DEPOSITION OF TITANIUM OXIDE FILMS
#21 | 2014-11-20Declarative configuration and execution of card content management operations for trusted service manager
#22 | 2013-11-28Remote card content management using synchronous server-side scripting
#23 | 2013-11-28Remote card content management using synchronous server-side scripting
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