Dirk EHM

City:

Beckingen

Country:

Germany

Published Applications:

Last publication date:

2026-06-25

Top Assignees for applications by Dirk EHM

The entities that hold a legal rights for patent applications filed by inventor EHM Dirk:

Carl Zeiss SMT GmbH 4 Oberkochen, Germany

Recent patent applications by EHM Dirk

Dirk EHM from Beckingen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-06-25

US20260177936A1

Physics

DEVICE AND METHOD FOR TREATING THE SURFACE OF AN OPTICAL ELEMENT OF A LITHOGRAPHY SYSTEM IN AN ATOMIC LAYER DEPOSITON PROCESS OR AN ATOMIC LAYER ETCHING PROCESS

#2 | 2026-06-04

US20260153812A1

Physics

OPTICAL ASSEMBLY FOR AN EUV PROJECTION EXPOSURE APPARATUS, EUV PROJECTION EXPOSURE APPARATUS

#3 | 2025-08-14

US20250258436A1

Physics

EUV COLLECTOR FOR USE IN AN EUV PROJECTION EXPOSURE APPARATUS

#4 | 2024-09-12

US20240302756A1

Physics

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPTICAL ELEMENT

#5 | 2024-07-25

US20240248408A1

Physics

MULTI-MIRROR ARRAY

#6 | 2024-04-04

US20240111216A1

Physics

PROCESS FOR DEPOSITION OF AN OUTER LAYER, REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELENGTH RANGE AND EUV LITHOGRAPHY SYSTEM

#7 | 2023-05-25

US20230162967A1

Electricity

RESIDUAL GAS ANALYSER, AND EUV LITHOGRAPHY SYSTEM HAVING A RESIDUAL GAS ANALYSER

#8 | 2022-09-29

US20220308463A1

Physics

Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus

#9 | 2022-09-29

US20220308457A1

Physics

Projection exposure apparatus having a device for determining the concentration of atomic hydrogen

InventorID:

5532542 ⎘