Jena
Germany
14
2022-03-10
The entities that hold a legal rights for patent applications filed by inventor Seitz Holger:
Holger Seitz from Jena, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Method and apparatus for characterizing a microlithographic mask
#2 | 2021-05-27Inspection device for masks for semiconductor lithography and method
#3 | 2019-04-25Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit
#4 | 2019-04-11Method and appliance for predicting the imaging result obtained with a mask when a lithography process is carried out
#5 | 2019-01-10Method and device for characterizing a mask for microlithography
#6 | 2019-01-10Inspection device for masks for semiconductor lithography and method
#7 | 2018-06-21Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit
#8 | 2018-04-05Method and device for determining an OPC model
#9 | 2015-07-16Emulation of reproduction of masks corrected by local density variations
#10 | 2015-01-01Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit
#11 | 2013-12-05Microscope and method for characterizing structures on an object
#12 | 2012-06-28Mask inspection microscope with variable illumination setting
#13 | 2012-03-29Method for characterizing a feature on a mask and device for carrying out the method
#14 | 2011-01-20Method and apparatus for measuring of masks for the photo-lithography
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