Ryosuke SEI

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2026-03-19

Top Assignees for applications by Ryosuke SEI

The entities that hold a legal rights for patent applications filed by inventor SEI Ryosuke:

AGC Inc. 2 Tokyo, Japan
SHOWA DENKO K.K. 1 Tokyo, Japan

Recent patent applications by SEI Ryosuke

Ryosuke SEI from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-03-19

US20260079389A1

Physics

MULTILAYER REFLECTIVE FILM-PROVIDED SUBSTRATE, METHOD FOR PRODUCING MULTILAYER REFLECTIVE FILM-PROVIDED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING REFLECTIVE MASK

#2 | 2025-05-15

US20250155793A1

Physics

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, METHOD FOR MANUFACTURING SAME, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SAME

#3 | 2022-11-10

US20220359907A1

Electricity

LITHIUM ION-CONDUCTING OXIDE

InventorID:

5573042 ⎘