Hsinchu
Taiwan
10
2025-06-12
The entities that hold a legal rights for patent applications filed by inventor Wang Han:
Han Wang from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF
#2 | 2025-02-20PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF
#3 | 2024-11-14TRANSISTOR, SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR STRUCTURE
#4 | 2024-03-21Pellicle for an EUV lithography mask and a method of manufacturing thereof
#5 | 2023-12-21INTERCONNECT STRUCTURE AND METHOD OF FORMING THE SAME
#6 | 2023-08-17PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF
#7 | 2023-06-29PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF
#8 | 2023-02-09Pellicle for an EUV lithography mask and a method of manufacturing thereof
#9 | 2023-02-09Pellicle for an EUV lithography mask and a method of manufacturing thereof
#10 | 2023-01-12TRANSISTOR, SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR STRUCTURE
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