Inventor profile of:

Jan HORN

City:

Munich

Country:

Germany

Published Applications:

25

Last publication date:

2023-03-23

Top Assignees for applications by Jan HORN

The entities that hold a legal rights for patent applications filed by inventor HORN Jan:

Recent patent applications by HORN Jan

Jan HORN from Munich, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2023-03-23
US20230088791A1
Physics

Mirror, in particular for microlithography

#2 | 2022-01-06
US20220004107A1
Physics

Optical arrangement and lithography apparatus

#3 | 2021-06-24
US20210190951A1
Physics

METHOD FOR OPERATING A LIDAR SYSTEM

#4 | 2021-03-04
US20210066037A1
Electricity

Multi-beam particle beam system

#5 | 2021-01-28
US20210026014A1
Physics

Apparatus and method for ascertaining a distance to an object

#6 | 2020-11-19
US20200363731A1
Physics

Image sensor, position sensor device, lithography system, and method for operating an image sensor

#7 | 2020-04-16
US20200114519A1
Performing operations; transporting

System, method and marker for the determination of the position of a movable object in space

#8 | 2019-08-22
US20190259575A1
Electricity

Multi-beam particle beam system

#9 | 2019-06-27
US20190196343A1
Physics

Device for transmitting electrical signals, and lithography apparatus

#10 | 2019-06-20
US20190187574A1
Physics

Control device

#11 | 2018-07-05
US20180188656A1
Physics

Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system

#12 | 2018-03-08
US20180067400A1
Physics

Sensor assembly and method for determining respective positions of a number of mirrors of a lithography system

#13 | 2018-03-08
US20180067399A1
Physics

Sensor assembly and method for determining respective positions of a number of mirrors of a lithography system

#14 | 2018-01-04
US20180003951A1
Physics

Multi-mirror array

#15 | 2017-02-09
US20170038555A1
Physics

Device and method for controlling positioning of multiple adjustable mirror elements in a multi-mirror arrangement

#16 | 2016-09-15
US20160266502A1
Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#17 | 2016-08-25
US20160246186A1
Physics

Device for determining a tilt angle of at least one mirror of a lithography system, and method

#18 | 2016-06-16
US20160170201A1
Physics

Optical component

#19 | 2016-01-28
US20160025952A1
Physics

Optical module

#20 | 2015-10-22
US20150300807A1
Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#21 | 2014-08-21
US20140233006A1
Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#22 | 2014-08-14
US20140226141A1
Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#23 | 2013-04-11
US20130088698A1
Physics

Methods and devices for driving micromirrors

#24 | 2012-11-22
US20120293784A1
Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#25 | 2010-12-09
US20100309449A1
Physics

Illumination system for a microlithographic projection exposure apparatus

InventorID:

5691658 ⎘