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Inventor profile of:

Daisuke Sawamoto

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2022-05-19

Top Assignees for applications by Daisuke Sawamoto

The entities that hold a legal rights for patent applications filed by inventor Sawamoto Daisuke:

ADEKA CORPORATION 11 Tokyo, Japan
ADEKA CORPORATION 1 Arakawa-ku, Tokyo, Japan
TOKYO INSTITUTE OF TECHNOLOGY 1 Tokyo, Japan

Recent patent applications by Sawamoto Daisuke

Daisuke Sawamoto from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2022-05-19

US20220153698A1

Chemistry; metallurgy

Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product

#2 | 2018-07-26

US20180208832A1

Chemistry; metallurgy

Encapsulated agent, method of manufacturing encapsulated agent, and variable viscosity fluid

#3 | 2018-07-26

US20180208831A1

Chemistry; metallurgy

ENCAPSULATED AGENT AND VARIABLE VISCOSITY FLUID

#4 | 2017-10-05

US20170283520A1

Chemistry; metallurgy

Oxime ester compound and photopolymerization initiator containing the same

#5 | 2016-07-21

US20160211085A1

Electricity

Compound and photoelectric conversion device

#6 | 2015-03-05

US20150064623A1

Physics

Compound and photosensitive resin composition

#7 | 2013-12-26

US20130341572A1

Electricity

Compound and photoelectric conversion device

#8 | 2010-09-30

US20100249262A1

Chemistry; metallurgy

Oxime ester compound and photopolymerization initiator containing the same

#9 | 2010-03-25

US20100075254A1

Chemistry; metallurgy

Oxime ester compound and photopolymerization initiator containing the same

#10 | 2009-11-26

US20090292039A1

Chemistry; metallurgy

OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING THE SAME

#11 | 2007-11-22

US20070270522A1

Chemistry; metallurgy

Oxime ester compound and photopolymerization initiator containing such compound

InventorID:

582982 ⎘