Pleasanton, California
United States
24
2015-02-12
The entities that hold a legal rights for patent applications filed by inventor Lenz Eric H.:
Eric H. Lenz from Pleasanton, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Airflow management for low particulate count in a process tool
#2 | 2014-02-06Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber
#3 | 2013-12-26Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system
#4 | 2011-11-17Fast gas switching plasma processing apparatus
#5 | 2011-09-29Reduction of particle contamination produced by moving mechanisms in a process tool
#6 | 2011-09-29Airflow management for low particulate count in a process tool
#7 | 2011-08-18Substrate load and unload mechanisms for high throughput
#8 | 2010-06-24Gas distribution system having fast gas switching capabilities
#9 | 2010-05-20Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor
#10 | 2009-10-01High throughput cleaner chamber
#11 | 2009-04-28Lower electrode design for higher uniformity
#12 | 2009-02-12Magnetic enhancement for mechanical confinement of plasma
#13 | 2008-07-17Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor
#14 | 2008-02-21Apparatus for reducing polymer deposition on a substrate and substrate support
#15 | 2007-08-07Apparatus for reducing polymer deposition on a substrate and substrate support
#16 | 2007-03-22Fast gas switching plasma processing apparatus
#17 | 2007-03-01Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system
#18 | 2007-01-25Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber
#19 | 2006-08-22Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system
#20 | 2005-11-03Gas distribution system having fast gas switching capabilities
#21 | 2005-05-19Chamber configuration for confining a plasma
#22 | 2005-03-29Chamber configuration for confining a plasma
#23 | 2005-01-13Magnetic enhancement for mechanical confinement of plasma
#24 | 2005-01-04Methods for etching dielectric materials
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