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Inventor profile of:

Shinya Handa

City:

Osaka

Country:

Japan

Published Applications:

7

Last publication date:

2025-12-04

Top Assignees for applications by Shinya Handa

The entities that hold a legal rights for patent applications filed by inventor Handa Shinya:

  • DAIKIN INDUSTRIES, LTD. 7 Osaka, Japan
  • The University of Tokyo 1 Tokyo, Japan

Recent patent applications by Handa Shinya

Shinya Handa from Osaka, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-12-04
US20250368785A1
Chemistry; metallurgy

SILANE COMPOUND

#2 | 2025-07-03
US20250215025A1
Chemistry; metallurgy

FLUORINE ATOM CONTAINING SILANE COMPOUND

#3 | 2025-02-06
US20250043096A1
Chemistry; metallurgy

METHOD FOR PRODUCING LOW-MOLECULAR-WEIGHT FLUORINE COMPOUND

#4 | 2024-06-20
US20240199657A1
Chemistry; metallurgy

SURFACE TREATMENT AGENT

#5 | 2024-06-06
US20240182641A1
Chemistry; metallurgy

FLUOROPOLYETHER COMPOUND

#6 | 2023-11-16
US20230365832A1
Chemistry; metallurgy

SURFACE TREATMENT AGENT

#7 | 2023-09-28
US20230303748A1
Chemistry; metallurgy

FLUOROPOLYMER, AQUEOUS LIQUID DISPERSION, COMPOSITION, AND CROSSLINKED PRODUCT

InventorID:

5861007 ⎘

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