Beijing
China
15
2026-05-28
The entities that hold a legal rights for patent applications filed by inventor Wei Yayi:
Yayi Wei from Beijing, CN has applied for patents for these inventions. The list has both pending applications and granted patents:
HARD MASK STRUCTURE FOR INTEGRATED CIRCUIT MANUFACTURING, AND METHOD FOR MANUFACTURING INTEGRATED CIRCUIT DEVICE
#2 | 2026-05-28METHOD AND APPARATUS FOR ELECTRON BEAM EXPOSURE
#3 | 2026-05-07METHOD AND APPARATUS FOR DETERMINING PROCESS WINDOW, AND COMPUTER DEVICE
#4 | 2026-04-30METHOD AND STRUCTURE FOR LITHOGRAPHY ALIGNMENT
#5 | 2026-04-30SELF-EXCITATION LITHOGRAPHY METHOD WITH SELF-ALIGNMENT EFFECT
#6 | 2026-04-02METHOD FOR CONSTRUCTING CONDITIONAL TEST LAYOUT GENERATOR
#7 | 2025-12-18METHOD AND APPARATUS FOR TRAINING ON IMAGING OF PLASMA LITHOGRAPHY
#8 | 2025-07-10ANALYTIC METHOD AND DEVICE FOR QUANTITATIVELY CALCULATING LINE EDGE ROUGHNESS IN PLASMA ULTRA-DIFFRACTION PHOTOETCHING PROCESS
#9 | 2024-10-17OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRATION OF LITHOGRAPHY SYSTEM
#10 | 2024-06-06METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAM
#11 | 2024-05-30Method and device for optimizing mask parameters
#12 | 2024-03-07METHOD FOR CORRECTING LITHOGRAPHY PATTERN OF SURFACE PLASMA
#13 | 2024-02-15Method for manufacturing semiconductor device
#14 | 2024-02-01Method for manufacturing semiconductor device
#15 | 2024-01-04METHOD AND APPARATUS FOR OPTIMIZING LITHOGRAPHY QUALITY, ELECTRONIC DEVICE, MEDIUM AND PROGRAM PRODUCT
5955907 ⎘