Matthew M. MEYER

City:

Midland, Michigan

Country:

United States

Published Applications:

Last publication date:

2014-01-02

Top Assignees for applications by Matthew M. MEYER

The entities that hold a legal rights for patent applications filed by inventor MEYER Matthew M.:

Matthew M. MEYER from Midland, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist

Polymers, photoresist compositions and methods of forming photolithographic patterns

InventorID:

596237 ⎘