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Inventor profile of:

Michael Lauter

City:

Mannheim

Country:

Germany

Published Applications:

Last publication date:

2021-04-08

Top Assignees for applications by Michael Lauter

The entities that hold a legal rights for patent applications filed by inventor Lauter Michael:

BASF SE 18 Ludwigshafen, Germany
BASF SE 3 Ludwigshafen am Rhein, Germany
BASF SE 1 Ludwighsafen, Germany

Recent patent applications by Lauter Michael

Michael Lauter from Mannheim, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2021-04-08

US20210102093A1

Chemistry; metallurgy

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT COMPRISING SUBSTRATES

#2 | 2020-09-17

US20200294813A1

Electricity

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

#3 | 2020-09-17

US20200291267A1

Chemistry; metallurgy

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT AND / OR COBALT ALLOY COMPRISING SUBSTRATES

#4 | 2020-08-13

US20200255713A1

Chemistry; metallurgy

Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors

#5 | 2019-01-03

US20190002802A1

Chemistry; metallurgy

Composition for post chemical-mechanical-polishing cleaning

#6 | 2018-12-27

US20180371371A1

Chemistry; metallurgy

Composition for post chemical-mechanical-polishing cleaning

#7 | 2018-08-16

US20180230333A1

Chemistry; metallurgy

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates

#8 | 2018-01-18

US20180016468A1

Chemistry; metallurgy

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

#9 | 2017-12-28

US20170369743A1

Chemistry; metallurgy

Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium

#10 | 2017-12-28

US20170369741A1

Chemistry; metallurgy

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

#11 | 2017-12-21

US20170362464A1

Chemistry; metallurgy

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

#12 | 2017-06-15

US20170166778A1

Chemistry; metallurgy

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A POLY(AMINOACID)

#13 | 2017-06-08

US20170158913A1

Chemistry; metallurgy

Chemical mechanical polishing (CMP) composition

#14 | 2016-07-14

US20160200943A1

Chemistry; metallurgy

Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors

#15 | 2016-06-09

US20160160083A1

Chemistry; metallurgy

CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIA

#16 | 2015-04-30

US20150118845A1

Electricity

Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors

#17 | 2015-01-15

US20150017454A1

Chemistry; metallurgy

Chemical mechanical polishing (CMP) composition comprising a protein

#18 | 2014-07-31

US20140213057A1

Chemistry; metallurgy

Chemical mechanical polishing (CMP) composition comprising a glycoside

#19 | 2014-01-09

US20140011362A1

Chemistry; metallurgy

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A NON-IONIC SURFACTANT AND AN AROMATIC COMPOUND COMPRISING AT LEAST ONE ACID GROUP

#20 | 2014-01-09

US20140011361A1

Chemistry; metallurgy

Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt

#21 | 2014-01-02

US20140004703A1

Chemistry; metallurgy

Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine

#22 | 2012-08-16

US20120208344A1

Chemistry; metallurgy

Chemical mechanical polishing (CMP) composition comprising inorganic particles and polymer particles

InventorID:

596623 ⎘