Joetsu
Japan
45
2023-09-07
The entities that hold a legal rights for patent applications filed by inventor Kori Daisuke:
Daisuke Kori from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
#2 | 2023-08-17COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN
#3 | 2023-08-03COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM
#4 | 2023-05-04MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM
#5 | 2023-04-20MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
#6 | 2022-08-25MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM
#7 | 2022-07-07MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
#8 | 2022-07-07MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, COMPOUND, AND POLYMER
#9 | 2022-06-09Composition for forming silicon-containing resist underlayer film and patterning process
#10 | 2022-05-26Resist underlayer film material, patterning process, and method for forming resist underlayer film
#11 | 2022-04-07MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM
#12 | 2021-12-23Resist underlayer film material, patterning process, and method for forming resist underlayer film
#13 | 2021-10-07Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film
#14 | 2021-09-16Material for forming organic film, method for forming organic film, patterning process, and compound
#15 | 2021-09-09Coating-type composition for forming organic film, patterning process, polymer, and method for manufacturing polymer
#16 | 2021-09-02Material for forming organic film, patterning process, and polymer
#17 | 2021-07-01Material for forming organic film, method for forming organic film, patterning process, and compound
#18 | 2021-06-17Material for forming organic film, method for forming organic film, patterning process, and compound
#19 | 2021-06-03Material for forming organic film, patterning process, and polymer
#20 | 2021-01-14Composition for forming organic film, patterning process, and polymer
#21 | 2021-01-07Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer
#22 | 2020-12-10Composition for forming organic film, patterning process, and polymer
#23 | 2020-12-03Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
#24 | 2020-11-19Composition for forming organic film, patterning process, and polymer
#25 | 2020-11-12Composition for forming organic film, patterning process, and polymer
#26 | 2020-10-22Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film
#27 | 2020-10-22Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film
#28 | 2019-06-27Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process
#29 | 2019-06-27Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate
#30 | 2019-02-28Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
#31 | 2019-02-28Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer
#32 | 2019-01-24Composition for forming organic film, patterning process, and resin for forming organic film
#33 | 2018-11-01Method of cleaning and drying semiconductor substrate
#34 | 2018-10-04Resist underlayer film composition, patterning process, and method for forming resist underlayer film
#35 | 2018-10-04Resist underlayer film composition, patterning process, and method for forming resist underlayer film
#36 | 2016-06-02Rinse solution for pattern formation and pattern forming process
#37 | 2016-06-02Rinse solution for pattern formation and pattern forming process
#38 | 2014-12-11Underlayer film-forming composition and pattern forming process
#39 | 2014-12-11Underlayer film-forming composition and pattern forming process
#40 | 2014-12-11Underlayer film-forming composition and pattern forming process
#41 | 2014-12-11Underlayer film-forming composition and pattern forming process
#42 | 2014-12-11Naphthalene derivative, resist bottom layer material, and patterning process
#43 | 2012-10-04Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process
#44 | 2012-03-15Naphthalene derivative, resist bottom layer material, and patterning process
#45 | 2011-12-22Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process
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