Hsinchu
Taiwan
12
2025-10-16
The entities that hold a legal rights for patent applications filed by inventor Ueno Tetsuji:
Tetsuji Ueno from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES WITH TUNABLE LOW-K INNER AIR SPACERS
#2 | 2024-05-16BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES
#3 | 2023-08-24Seal material for air gaps in semiconductor devices
#4 | 2023-08-03Air spacer formation with a spin-on dielectric material
#5 | 2022-11-17EPITAXIAL GROWTH METHODS AND STRUCTURES THEREOF
#6 | 2022-11-17TUNABLE LOW-K INNER AIR SPACERS OF SEMICONDUCTOR DEVICES
#7 | 2022-09-08Air spacer formation with a spin-on dielectric material
#8 | 2021-12-30Methods for manufacturing semiconductor devices with tunable low-k inner air spacers
#9 | 2021-06-24Bilayer seal material for air gaps in semiconductor devices
#10 | 2020-09-03Epitaxial growth methods and structures thereof
#11 | 2019-04-11Epitaxial growth methods and structures thereof
#12 | 2017-08-03Epitaxial growth methods and structures thereof
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