Joetsu
Japan
15
2022-12-22
The entities that hold a legal rights for patent applications filed by inventor Kotake Masaaki:
Masaaki Kotake from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
CHEMICALLY AMPLIFIED RESIST COMPOSITION, PHOTOMASK BLANK, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING POLYMER COMPOUND
#2 | 2022-09-01Chemically amplified negative resist composition and resist pattern forming process
#3 | 2022-08-25Chemically amplified positive resist composition and resist pattern forming process
#4 | 2020-09-17Conductive polymer composition, coated product and patterning process
#5 | 2020-04-30Onium salt, negative resist composition, and resist pattern forming process
#6 | 2020-03-05Sulfonium compound, positive resist composition, and resist pattern forming process
#7 | 2019-11-28Chemically amplified negative resist composition and resist pattern forming process
#8 | 2019-11-28Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process
#9 | 2019-01-10Resist composition and resist patterning process
#10 | 2018-06-28Chemically amplified negative resist composition and resist pattern forming process
#11 | 2018-06-28Chemically amplified positive resist composition and resist pattern forming process
#12 | 2018-02-08Positive resist composition, resist pattern forming process, and photomask blank
#13 | 2018-02-08Negative resist composition and resist pattern forming process
#14 | 2016-10-13Chemically amplified negative resist composition using novel onium salt and resist pattern forming process
#15 | 2016-08-25Chemically amplified positive resist composition and pattern forming process
6009653 ⎘