Tsutomu Ogihara

THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS

#2 | 2023-08-31

US20230274936A1

PLANARIZING AGENT FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS

#3 | 2023-08-03

US20230244149A1

Composition for forming silicon-containing resist underlayer film and patterning process

#4 | 2023-06-29

US20230203354A1

MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM

#5 | 2023-02-23

US20230059089A1

MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FILM USING THE SAME, AND PATTERNING PROCESS USING MATERIAL FOR FORMING ADHESIVE FILM

#6 | 2022-07-14

US20220221793A1

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND

#7 | 2022-07-07

US20220214618A1

MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER

#8 | 2021-12-23

US20210397092A1

Resist underlayer film material, patterning process, and method for forming resist underlayer film

#9 | 2021-10-28

US20210335649A1

Method for controlling flatness, method for forming coating film, apparatus for controlling flatness, and apparatus for forming coating film

#10 | 2021-09-09

US20210278766A1

Coating-type composition for forming organic film, patterning process, polymer, and method for manufacturing polymer

#11 | 2021-03-25

US20210088908A1

Composition for forming silicon-containing resist underlayer film and patterning process

#12 | 2021-01-28

US20210026246A1

Composition for forming silicon-containing resist underlayer film and patterning process

#13 | 2021-01-07

US20210003920A1

Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer

#14 | 2020-12-03

US20200381247A1

Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process

#15 | 2020-11-12

US20200356007A1

Composition for forming organic film, patterning process, and polymer

#16 | 2020-10-29

US20200341377A1

Composition for forming silicon-containing resist underlayer film and patterning process

#17 | 2020-10-29

US20200340806A1

Method for measuring distance of diffusion of curing catalyst

#18 | 2020-10-22

US20200333709A1

Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film

#19 | 2020-10-22

US20200332062A1

Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film

#20 | 2020-07-23

US20200233303A1

Composition for forming silicon-containing resist underlayer film and patterning process

#21 | 2020-07-09

US20200216670A1

Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process

#22 | 2020-05-21

US20200159120A1

Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process

#23 | 2020-05-14

US20200148709A1

Method for producing iodine-containing silicon compound

#24 | 2019-12-26

US20190391493A1

Compound and composition for forming organic film

#25 | 2019-12-26

US20190390000A1

Compound, method for manufacturing the compound, and composition for forming organic film

#26 | 2019-11-21

US20190354017A1

Patterning process

#27 | 2019-11-21

US20190354016A1

Patterning process

#28 | 2019-10-03

US20190300498A1

Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process

#29 | 2019-08-22

US20190258160A1

Resist composition and patterning process

#30 | 2019-06-27

US20190198341A1

Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process

#31 | 2019-06-27

US20190194391A1

Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate

#32 | 2019-02-28

US20190067021A1

Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process

#33 | 2019-02-28

US20190064659A1

Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer

#34 | 2019-01-24

US20190027369A1

Composition for forming organic film, patterning process, and resin for forming organic film

#35 | 2018-11-01

US20180315594A1

Method of cleaning and drying semiconductor substrate

#36 | 2018-10-04

US20180284615A1

Resist underlayer film composition, patterning process, and method for forming resist underlayer film

#37 | 2018-10-04

US20180284614A1

Resist underlayer film composition, patterning process, and method for forming resist underlayer film

#38 | 2016-06-02

US20160154314A1

Rinse solution for pattern formation and pattern forming process

#39 | 2016-06-02

US20160154312A1

Rinse solution for pattern formation and pattern forming process

#40 | 2014-12-11

US20140363958A1

Underlayer film-forming composition and pattern forming process

#41 | 2014-12-11

US20140363957A1

Underlayer film-forming composition and pattern forming process

#42 | 2014-12-11

US20140363956A1

Underlayer film-forming composition and pattern forming process

#43 | 2014-12-11

US20140363955A1

Underlayer film-forming composition and pattern forming process

#44 | 2014-12-11

US20140363768A1

Naphthalene derivative, resist bottom layer material, and patterning process

#45 | 2014-08-21

US20140235057A1

Pattern forming process

#46 | 2014-08-21

US20140234785A1

Pattern forming process

#47 | 2014-08-21

US20140234781A1

Pattern forming process

#48 | 2014-08-14

US20140227641A1

Silicon-containing antireflective coatings including non-polymeric silsesquioxanes

#49 | 2012-10-04

US20120252218A1

Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process

#50 | 2012-03-15

US20120064725A1

Naphthalene derivative, resist bottom layer material, and patterning process

#51 | 2011-12-22

US20110311920A1

Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process

#52 | 2009-05-28

US20090136869A1

Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method

#53 | 2009-01-08

US20090011372A1

Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method

#54 | 2008-11-06

US20080274432A1

Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method

#55 | 2008-01-31

US20080026322A1

Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method

#56 | 2007-10-11

US20070238300A1

Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method

#57 | 2007-05-24

US20070117252A1

Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method

#58 | 2007-05-24

US20070117044A1

Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method

#59 | 2005-12-15

US20050277756A1

Porous film-forming composition, patterning process, and porous sacrificial film

#60 | 2005-12-15

US20050277755A1

Sacrificial film-forming composition, patterning process, sacrificial film and removal method

#61 | 2005-12-15

US20050277058A1

Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same

#62 | 2005-12-15

US20050274692A1