Joetsu
Japan
11
2023-10-19
The entities that hold a legal rights for patent applications filed by inventor Watanabe Tsukasa:
Tsukasa Watanabe from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS
#2 | 2021-03-04Resist material and patterning process
#3 | 2021-03-04Resist material and patterning process
#4 | 2020-10-29Composition for forming silicon-containing resist underlayer film and patterning process
#5 | 2020-10-29Method for measuring distance of diffusion of curing catalyst
#6 | 2020-07-23Composition for forming silicon-containing resist underlayer film and patterning process
#7 | 2020-05-21Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process
#8 | 2020-05-14Method for producing iodine-containing silicon compound
#9 | 2019-11-21Patterning process
#10 | 2019-11-21Patterning process
#11 | 2019-08-22Resist composition and patterning process
6011099 ⎘