Joetsu
Japan
52
2023-09-07
The entities that hold a legal rights for patent applications filed by inventor Kobayashi Tomohiro:
Tomohiro Kobayashi from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Resist composition and patterning process
#2 | 2022-07-28Resist composition and patterning process
#3 | 2021-07-01Resist composition and patterning process
#4 | 2021-05-20Onium salt compound, chemically amplified resist composition and patterning process
#5 | 2021-03-04Resist material and patterning process
#6 | 2021-03-04Resist material and patterning process
#7 | 2020-10-29Method for measuring distance of diffusion of curing catalyst
#8 | 2020-08-06Resist composition and patterning process
#9 | 2020-04-30Substrate protective film-forming composition and pattern forming process
#10 | 2019-05-30Patterning process
#11 | 2015-03-26Sulfonium salt, chemically amplified resist composition, and pattern forming process
#12 | 2014-10-30Patterning process and resist composition
#13 | 2014-10-16Patterning process, resist composition, polymer, and monomer
#14 | 2014-09-11Patterning process and resist composition
#15 | 2014-08-28Patterning process and resist composition
#16 | 2014-07-31Patterning process and resist composition
#17 | 2014-07-17Patterning process, resist composition, polymer, and monomer
#18 | 2014-01-09Patterning process and resist composition
#19 | 2013-12-19Patterning process and resist composition
#20 | 2013-09-05Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
#21 | 2013-08-29Preparation of polymer, resulting polymer, resist composition, and patterning process
#22 | 2013-08-29Polymer, making method, resist composition, and patterning process
#23 | 2013-06-20Patterning process, resist composition, polymer, and polymerizable ester compound
#24 | 2013-05-23Negative pattern forming process
#25 | 2013-02-28Patterning process and resist composition
#26 | 2012-12-27Patterning process and resist composition
#27 | 2012-12-06Patterning process and resist composition
#28 | 2012-11-01Patterning process
#29 | 2012-10-25Patterning process
#30 | 2012-09-06Chemically amplified resist composition and patterning process
#31 | 2012-08-02Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound
#32 | 2012-07-19Nitrogen-containing monomer, polymer, resist composition, and patterning process
#33 | 2012-05-31Positive resist composition and patterning process
#34 | 2012-04-26Sulfonium salt, resist composition, and patterning process
#35 | 2012-03-29Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process
#36 | 2012-03-01Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process
#37 | 2012-02-23Sulfonium salt, resist composition, and patterning process
#38 | 2010-12-02Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process
#39 | 2010-06-03Resist composition and patterning process
#40 | 2010-05-06Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
#41 | 2009-10-01Polymer, polymer preparation method, resist composition and patterning process
#42 | 2009-08-20Polymer, resist composition, and patterning process
#43 | 2009-08-20Resist composition, resist protective coating composition, and patterning process
#44 | 2009-07-23Hydrogenated ring-opening metathesis polymer, resist composition and patterning process
#45 | 2009-01-08Resist composition and patterning process
#46 | 2008-10-02Resist composition and patterning process
#47 | 2008-05-22Polymer, resist composition, and patterning process
#48 | 2008-05-01Nitrogen-containing organic compound, resist composition and patterning process
#49 | 2008-04-10Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method
#50 | 2008-01-10Positive resist compositions and patterning process
#51 | 2008-01-10Positive resist compositions and patterning process
#52 | 2007-06-28Polymers, resist compositions and patterning process
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