Joetsu
Japan
17
2023-10-19
The entities that hold a legal rights for patent applications filed by inventor Biyajima Yusuke:
Yusuke Biyajima from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS
#2 | 2023-08-03Composition for forming silicon-containing resist underlayer film and patterning process
#3 | 2023-06-29MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM
#4 | 2023-02-23MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FILM USING THE SAME, AND PATTERNING PROCESS USING MATERIAL FOR FORMING ADHESIVE FILM
#5 | 2022-05-26Resist underlayer film material, patterning process, and method for forming resist underlayer film
#6 | 2021-12-23Resist underlayer film material, patterning process, and method for forming resist underlayer film
#7 | 2021-09-16Material for forming organic film, method for forming organic film, patterning process, and compound
#8 | 2021-07-01Material for forming organic film, method for forming organic film, patterning process, and compound
#9 | 2021-06-17Material for forming organic film, method for forming organic film, patterning process, and compound
#10 | 2021-03-25Composition for forming silicon-containing resist underlayer film and patterning process
#11 | 2021-01-28Composition for forming silicon-containing resist underlayer film and patterning process
#12 | 2020-10-29Composition for forming silicon-containing resist underlayer film and patterning process
#13 | 2020-10-29Method for measuring distance of diffusion of curing catalyst
#14 | 2020-07-23Composition for forming silicon-containing resist underlayer film and patterning process
#15 | 2020-05-21Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process
#16 | 2019-06-27Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process
#17 | 2014-08-21Pattern forming process
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