Joetsu
Japan
56
2023-05-04
The entities that hold a legal rights for patent applications filed by inventor Katayama Kazuhiro:
Kazuhiro Katayama from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
#2 | 2022-04-07Sulfonium salt, chemically amplified resist composition, and patterning process
#3 | 2022-03-31Molecular resist composition and patterning process
#4 | 2020-12-03Molecular resist composition and patterning process
#5 | 2020-11-26Onium salt, chemically amplified resist composition and patterning process
#6 | 2020-10-08Sulfonium compound, chemically amplified resist composition, and patterning process
#7 | 2020-07-16Onium salt, chemically amplified resist composition, and patterning process
#8 | 2020-06-18Resist composition and patterning process
#9 | 2020-03-12Iodonium salt, resist composition, and pattern forming process
#10 | 2019-10-24Photoacid generator, chemically amplified resist composition, and patterning process
#11 | 2019-08-01Monomer, polymer, resist composition, and patterning process
#12 | 2019-02-28Monomer, polymer, resist composition, and patterning process
#13 | 2019-01-31Resist composition and pattern forming process
#14 | 2018-09-27Sulfonium salt, resist composition, and patterning process
#15 | 2017-11-02Carboxylic acid onium salt, chemically amplified resist composition, and pattern forming process
#16 | 2017-08-10Monomer, polymer, resist composition, and patterning process
#17 | 2017-05-11Monomer, polymer, resist composition, and patterning process
#18 | 2016-11-24Polymer, monomer, resist composition, and patterning process
#19 | 2016-07-14Pattern forming process and shrink agent
#20 | 2016-06-23Monomer, polymer, resist composition, and patterning process
#21 | 2016-05-19Pattern forming process and shrink agent
#22 | 2016-05-05Pattern forming process and shrink agent
#23 | 2015-04-09Resist composition and patterning process
#24 | 2014-10-30Patterning process and resist composition
#25 | 2014-10-16Patterning process, resist composition, polymer, and monomer
#26 | 2014-09-11Patterning process and resist composition
#27 | 2014-08-28Monomer, polymer, resist composition, and patterning process
#28 | 2014-08-14Pattern forming process
#29 | 2014-07-17Pattern forming process
#30 | 2014-07-17Patterning process, resist composition, polymer, and monomer
#31 | 2014-07-17Monomer, polymer, resist composition, and patterning process
#32 | 2014-03-06Resist composition and patterning process
#33 | 2014-03-06Resist composition and patterning process
#34 | 2013-12-19Patterning process and resist composition
#35 | 2013-08-15Patterning process and resist composition
#36 | 2013-08-15Monomer, polymer, resist composition, and patterning process
#37 | 2013-06-20Patterning process, resist composition, polymer, and polymerizable ester compound
#38 | 2013-05-23Negative pattern forming process
#39 | 2013-05-02Patterning process and resist composition
#40 | 2013-03-21Patterning process and resist composition
#41 | 2013-02-28Patterning process and resist composition
#42 | 2013-01-17Patterning process and resist composition
#43 | 2012-07-19Patterning process and resist composition
#44 | 2012-03-08Patterning process and resist composition
#45 | 2012-01-12Patterning process
#46 | 2011-04-21Patterning process and resist composition
#47 | 2011-02-10Patterning process and resist composition
#48 | 2010-12-02Patterning process and resist composition
#49 | 2010-11-25Resist-modifying composition and pattern forming process
#50 | 2010-11-25Resist-modifying composition and pattern forming process
#51 | 2010-07-15Patterning process
#52 | 2010-07-15Patterning process
#53 | 2010-06-24Patterning process
#54 | 2009-09-10Monomer, resist composition, and patterning process
#55 | 2009-08-20Double patterning process
#56 | 2009-02-26Patterning process and pattern surface coating composition
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