Inventor profile of:

Jack Chen

City:

San Francisco, California

Country:

United States

Published Applications:

16

Last publication date:

2026-05-28

Top Assignees for applications by Jack Chen

The entities that hold a legal rights for patent applications filed by inventor Chen Jack:

Recent patent applications by Chen Jack

Jack Chen from San Francisco, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-05-28
US20260150636A1
Electricity

WAFER EDGE DEPOSITION FOR WAFER LEVEL PACKAGING

#2 | 2026-05-21
US20260142135A1
Electricity

PLASMA-EXCLUSION-ZONE RINGS WITH PLASMA-EXCLUSION-ZONE RING NOTCHES FOR SUBSTRATE PROCESSING SYSTEMS

#3 | 2026-05-07
US20260130171A1
Electricity

PRESSURE CONTROL SYSTEM FOR A BEVEL EDGE ETCH CHAMBER IMPLEMENTING SUBSTRATE FRONTSIDE AND BACKSIDE PRESSURE CONTROL

#4 | 2025-11-27
US20250364225A1
Electricity

LOWER PLASMA EXCLUSION ZONE RINGS FOR BEVEL ETCHER

#5 | 2024-06-27
US20240210163A1
Physics

IN-SITU WAFER THICKNESS AND GAP MONITORING USING THROUGH BEAM LASER SENSOR

#6 | 2023-12-14
US20230402257A1
Electricity

TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER

#7 | 2023-11-02
US20230352278A1
Electricity

PLASMA-EXCLUSION-ZONE RINGS FOR PROCESSING NOTCHED WAFERS

#8 | 2023-10-05
US20230317445A1
Electricity

WAFER EDGE DEPOSITION FOR WAFER LEVEL PACKAGING

#9 | 2023-07-06
US20230215692A1
Electricity

Arcing Reduction in Wafer Bevel Edge Plasma Processing

#10 | 2023-05-11
US20230141653A1
Electricity

FRONTSIDE AND BACKSIDE PRESSURE MONITORING FOR SUBSTRATE MOVEMENT PREVENTION

#11 | 2021-11-11
US20210351018A1
Electricity

LOWER PLASMA EXCLUSION ZONE RING FOR BEVEL ETCHER

#12 | 2021-05-20
US20210151297A1
Electricity

Tunable upper plasma-exclusion-zone ring for a bevel etcher

#13 | 2017-09-07
US20170256393A1
Electricity

Systems and Methods for In-Situ Wafer Edge and Backside Plasma Cleaning

#14 | 2015-04-09
US20150099365A1
Electricity

Tunable upper plasma-exclusion-zone ring for a bevel etcher

#15 | 2015-01-22
US20150020848A1
Electricity

Systems and Methods for In-Situ Wafer Edge and Backside Plasma Cleaning

#16 | 2014-01-09
US20140007901A1
Electricity

METHODS AND APPARATUS FOR BEVEL EDGE CLEANING IN A PLASMA PROCESSING SYSTEM

InventorID:

601323 ⎘