Tainan
Taiwan
20
2024-10-31
The entities that hold a legal rights for patent applications filed by inventor Yang Chi:
Chi Yang from Tainan, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
PARTICLE IMAGE VELOCIMETRY OF EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS
#2 | 2024-09-05Lithography Apparatus and Method
#3 | 2023-11-09Apparatus and method for generating extreme ultraviolet radiation
#4 | 2023-10-12Method for performing lithography process, light source, and EUV lithography system
#5 | 2023-09-21Particle image velocimetry of extreme ultraviolet lithography systems
#6 | 2023-08-31Plasma position control for extreme ultraviolet lithography light sources
#7 | 2023-06-15Control of dynamic gas lock flow inlets of an intermediate focus cap
#8 | 2023-04-27Lithography apparatus and method
#9 | 2022-11-10Width adjustment of EUV radiation beam
#10 | 2022-09-22Module vessel with scrubber gutters sized to prevent overflow
#11 | 2022-09-08Control of dynamic gas lock flow inlets of an intermediate focus cap
#12 | 2022-09-01Light source, EUV lithography system, and method for performing circuit layout patterning process
#13 | 2021-12-16Plasma position control for extreme ultraviolet lithography light sources
#14 | 2021-10-14Thermal controlling method in lithography system
#15 | 2021-09-23Particle image velocimetry of extreme ultraviolet lithography systems
#16 | 2021-09-02Apparatus and method for generating extreme ultraviolet radiation
#17 | 2021-07-22EUV lithography system and method for decreasing debris in EUV lithography system
#18 | 2021-02-25Light source, EUV lithography system, and method for generating EUV radiation
#19 | 2020-12-03Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source
#20 | 2020-07-02Pressurized tin collection bucket with in-line draining mechanism
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