Joetsu
Japan
35
2024-02-15
The entities that hold a legal rights for patent applications filed by inventor Harada Daijitsu:
Daijitsu Harada from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Mask blank glass substrate
#2 | 2023-05-11WINDOW MATERIAL FOR OPTICAL ELEMENT, LID FOR OPTICAL ELEMENT PACKAGE, OPTICAL ELEMENT PACKAGE, AND OPTICAL DEVICE
#3 | 2023-02-09MASK BLANKS SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
#4 | 2022-11-03Synthetic quartz glass cavity member, synthetic quartz glass cavity lid, optical device package, and making methods
#5 | 2021-12-09Mask blank glass substrate
#6 | 2021-09-23Synthetic quartz glass substrate with antireflection film, window material, lid for optical element package, optical element package, and light irradiation device
#7 | 2020-11-05Large-size synthetic quartz glass substrate, evaluation method, and manufacturing method
#8 | 2020-01-23Synthetic quartz glass cavity member, synthetic quartz glass cavity lid, optical device package, and making methods
#9 | 2018-11-08Large-size synthetic quartz glass substrate, evaluation method, and manufacturing method
#10 | 2018-08-02Synthetic quartz glass lid precursor, synthetic quartz glass lid, and preparation methods thereof
#11 | 2018-03-01Rectangular glass substrate and method for preparing the same
#12 | 2018-02-08Synthetic quartz glass lid and optical device package
#13 | 2017-09-14Method for preparing synthetic quartz glass substrate
#14 | 2016-12-15Method for preparing synthetic quartz glass substrate
#15 | 2016-11-17Method for producing substrates
#16 | 2015-12-17Method for preparing synthetic quartz glass substrate
#17 | 2015-08-27Heat treatment method of synthetic quartz glass
#18 | 2015-07-23Method of preparing synthetic quartz glass substrate
#19 | 2015-01-22Polishing agent for synthetic quartz glass substrate
#20 | 2014-10-02Colloidal silica polishing composition and method for manufacturing synthetic quartz glass substrates using the same
#21 | 2014-05-01Rectangular mold-forming substrate
#22 | 2014-01-02Photomask-forming glass substrate and making method
#23 | 2013-08-08Manufacture of synthetic quartz glass substrate
#24 | 2013-06-20Method for recovery of cerium oxide
#25 | 2013-05-23Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same
#26 | 2013-05-16Method of preparing substrate
#27 | 2012-10-18Alkoxysilane compounds having fluoroalkyl group and method of preparing the same
#28 | 2012-10-18Silazane compounds having fluoroalkyl group and method of preparing the same
#29 | 2012-10-18Nanoimprint-mold release agent, surface treatment method, and nanoimprint mold
#30 | 2012-08-16Mold-forming substrate and inspection method
#31 | 2011-11-24Synthetic quartz glass substrate and making method
#32 | 2011-06-30Preparation of synthetic quartz glass substrates
#33 | 2011-06-16Photomask-forming glass substrate and making method
#34 | 2010-07-29Method of processing synthetic quartz glass substrate for semiconductor
#35 | 2009-02-05Storage container for photomask-forming synthetic quartz glass substrate
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