Sodegaura
Japan
14
2024-03-28
The entities that hold a legal rights for patent applications filed by inventor Ono Yosuke:
Yosuke Ono from Sodegaura, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING PELLICLE FILM
#2 | 2021-03-18Pellicle support frame, pellicle, method for manufacturing pellicle support frame, and exposure original plate and exposure device employing pellicle
#3 | 2021-01-14Supporting frame for pellicle, pellicle, method for manufacturing same, exposure master using same, and method for manufacturing semiconductor device
#4 | 2020-12-24Pellicle, exposure master, exposure device and method for manufacturing semiconductor device
#5 | 2020-02-27Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method
#6 | 2019-05-02Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device
#7 | 2018-08-23Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicle
#8 | 2018-02-15Pellicle manufacturing method and method for manufacturing photomask with pellicle
#9 | 2017-10-05Pellicle film, pellicle frame, pellicle, and method for producing same
#10 | 2017-07-06Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device
#11 | 2017-06-29Pellicle, pellicle production method and exposure method using pellicle
#12 | 2017-06-29Pellicle, production method thereof, exposure method
#13 | 2017-03-30Pellicle membrane, pellicle, original plate for exposure, exposure apparatus, and method of producing semiconductor device
#14 | 2016-05-26Pellicle and EUV exposure device comprising same
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