Funabashi-shi
Japan
16
2019-09-26
The entities that hold a legal rights for patent applications filed by inventor Shuto Keisuke:
Keisuke Shuto from Funabashi-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Polymerizable composition comprising reactive silsesquioxane compound and aromatic vinyl compound
#2 | 2019-08-22Reactive polysiloxane and polymerizable composition comprising same
#3 | 2019-08-22Polymerizable silane compound
#4 | 2019-06-06Polymerizable composition containing reactive silsesquioxane compound containing phenanthrene ring
#5 | 2018-12-27IMPRINT MATERIAL
#6 | 2018-08-30Polymerizable composition comprising silsesquioxane compound having acrylic group
#7 | 2018-06-28IMPRINT MATERIAL
#8 | 2017-10-26Sealing material composition for LED
#9 | 2017-09-21Imprint material
#10 | 2016-09-01Imprint material containing silsesquioxane compound and modified silicone compound
#11 | 2015-11-12Imprint material having low mold release property
#12 | 2014-08-07Imprint material
#13 | 2013-11-07Highly abrasion-resistant imprint material containing urethane compound
#14 | 2013-10-17Film forming composition for hard disk
#15 | 2013-01-31PLANARIZING FILM-FORMING COMPOSITION FOR HARD DISK AND HARD DISK PRODUCTION METHOD USING SAME
#16 | 2012-06-14High hardness imprint material
60264 ⎘