Ichihara
Japan
24
2024-08-15
The entities that hold a legal rights for patent applications filed by inventor Imada Tomoyuki:
Tomoyuki Imada from Ichihara, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKALINE DEVELOPABLE RESIST, RESIST CURABLE RESIN COMPOSITION, AND METHOD FOR PRODUCING PHENOLIC HYDROXY GROUP-CONTAINING RESIN
#2 | 2021-07-01Calixarene compound, curable composition, and cured product
#3 | 2020-05-28Resist material
#4 | 2019-09-12Calixarene compound and curable composition
#5 | 2019-06-06Novolak resins and resist materials
#6 | 2018-11-15Resin containing phenolic hydroxyl groups, and resist film
#7 | 2018-05-17Phenolic-hydroxyl-group-containing novolac resin and resist film
#8 | 2017-12-07Curable composition for permanent resist films, and permanent resist film
#9 | 2017-11-23Phenolic hydroxyl-containing compound, composition containing the same, and cured film of the composition
#10 | 2017-11-16Naphthol-type calixarene compound and method for producing the same, photosensitive composition, resist material, and coating
#11 | 2017-05-18Phenolic hydroxyl group-containing resin, production method therefor, photosensitive composition, resist material, coating film, curable composition and cured product thereof, and resist underlayer film
#12 | 2017-05-04Novolac-type phenolic hydroxyl group-containing resin, production method therefor, curable composition, composition for resist, and color resist
#13 | 2016-12-29Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition
#14 | 2016-06-23Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating
#15 | 2016-06-09Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film
#16 | 2015-10-01Phenolic hydroxyl group-containing compound, phenolic hydroxyl group-containing composition, (meth)acryloyl group-containing resin, curable composition, cured product thereof, and resist material
#17 | 2015-06-18Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition
#18 | 2014-01-23Positive photoresist composition, coating film thereof, and novolac phenol resin
#19 | 2013-12-19Radically curable compound, cured product thereof, and method for producing the compound
#20 | 2013-09-19Positive-type photoresist composition
#21 | 2006-11-02Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin
#22 | 2006-10-26Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin
#23 | 2006-10-19Phenolic resin formed from a difunctional phenol and a divinyl ether
#24 | 2006-08-08Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin
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