Ichihara
Japan
6
2019-06-06
The entities that hold a legal rights for patent applications filed by inventor Sato Yusuke:
Yusuke Sato from Ichihara, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Novolak resins and resist materials
#2 | 2018-11-15Resin containing phenolic hydroxyl groups, and resist film
#3 | 2018-05-17Phenolic-hydroxyl-group-containing novolac resin and resist film
#4 | 2017-05-04Novolac-type phenolic hydroxyl group-containing resin, production method therefor, curable composition, composition for resist, and color resist
#5 | 2016-06-23Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating
#6 | 2016-06-09Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film
6027466 ⎘