Inventor profile of:

Teppei Adachi

City:

Joetsu

Country:

Japan

Published Applications:

22

Last publication date:

2023-09-07

Top Assignees for applications by Teppei Adachi

The entities that hold a legal rights for patent applications filed by inventor Adachi Teppei:

Recent patent applications by Adachi Teppei

Teppei Adachi from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2023-09-07
US20230280651A1
Physics

Resist composition and patterning process

#2 | 2022-07-28
US20220236643A1
Physics

Resist composition and patterning process

#3 | 2021-07-01
US20210200083A1
Physics

Resist composition and patterning process

#4 | 2021-05-13
US20210141306A1
Physics

Resist composition and patterning process

#5 | 2020-04-30
US20200133123A1
Physics

Substrate protective film-forming composition and pattern forming process

#6 | 2019-02-28
US20190064664A1
Physics

Monomer, polymer, resist composition, and patterning process

#7 | 2019-01-31
US20190033716A1
Physics

Sulfonium salt, polymer, resist composition, and patterning process

#8 | 2019-01-31
US20190033715A1
Physics

Resist composition and pattern forming process

#9 | 2017-08-24
US20170242339A1
Physics

Positive resist composition and pattern forming process

#10 | 2017-08-10
US20170226252A1
Chemistry; metallurgy

Monomer, polymer, resist composition, and patterning process

#11 | 2017-08-10
US20170226250A1
Chemistry; metallurgy

Polymer, resist composition, and pattern forming process

#12 | 2017-06-29
US20170184967A1
Physics

Resist composition, pattern forming process, polymer, and monomer

#13 | 2017-04-06
US20170097567A1
Physics

Method for producing polymer

#14 | 2017-01-12
US20170008982A1
Chemistry; metallurgy

Monomer, polymer, positive resist composition, and patterning process

#15 | 2017-01-05
US20170003590A1
Physics

Resist composition and patterning process

#16 | 2016-12-15
US20160363866A1
Physics

Patterning process

#17 | 2016-10-13
US20160299431A1
Physics

Photomask blank, resist pattern forming process, and method for making photomask

#18 | 2015-11-26
US20150338744A1
Physics

Pattern forming process and shrink agent

#19 | 2015-03-26
US20150086929A1
Physics

Pattern forming process and shrink agent

#20 | 2014-09-18
US20140272707A1
Physics

Sulfonium salt, polymer, resist composition, and patterning process

#21 | 2014-06-12
US20140162189A1
Physics

Sulfonium salt, polymer, polymer making method, resist composition, and patterning process

#22 | 2014-02-20
US20140051026A1
Physics

Patterning process and resist composition

InventorID:

6028907 ⎘