Takeru Watanabe

Process for preparing 2-methyl-N-(2′-methylbutyl)butanamide

Process for preparing a 3,7-dimethylalkane compound

Acetal compounds and processes for preparing thereof, and processes for preparing aldehyde compounds from the acetal compounds

VINYLETHER COMPOUNDS AND PROCESSES FOR PREPARING ALDEHYDE COMPOUNDS AND A CARBOXYLATE COMPOUND THEREFROM

Processes for preparing a (1,2-dimethyl-3-methylenecyclopentyl)acetate compound and (1,2-dimethyl-3-methylenecyclopentyl)acetaldehyde

Process for preparing 2-methyl-N-(2′-methylbutyl)butanamide

Composition biologically active to stenoma catenifer and sustained release preparation comprising the same for controlling insect pest

Kinetic resolution reaction of a (1RS,2SR)-(2-hydroxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound, a process for preparing optically active trans-α-necrodyl isobutyrate, and a process for preparing optically active γ-necrodyl isobutyrate

Resist underlayer film material, patterning process, and method for forming resist underlayer film

Composition for forming silicon-containing resist underlayer film and patterning process

Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer

Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process

Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film

Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film

Epoxy compound, resist composition, and pattern forming process

Compound and composition for forming organic film

Compound, method for manufacturing the compound, and composition for forming organic film

Method for purifying an amino acid-n-carboxy anhydride

Method for producing polyalkylene glycol derivative having amino group at end

Method for producing polyalkylene glycol derivative having amino group at end

Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process

Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process

Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer

Resist underlayer film composition, patterning process, and method for forming resist underlayer film

Resist underlayer film composition, patterning process, and method for forming resist underlayer film

Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator

Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator

Method for producing polyalkylene glycol derivative having amino group at end

Method for producing polyalkylene glycol derivative with narrow molecular weight distribution, and acetal group-containing alcohol compound for use therein and alkali metal salt thereof

Method for producing polyalkylene glycol derivative having amino group at end, with narrow molecular weight distribution

Naphthalene derivative, resist bottom layer material, and patterning process

Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process

Patterning process, resist composition, polymer, and polymerizable ester compound

Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film

Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom

Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process

Chemically amplified resist composition and patterning process

Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound

Resist pattern forming process

Nitrogen-containing monomer, polymer, resist composition, and patterning process

Patterning process and resist composition

Basic compound, chemically amplified resist composition, and patterning process

Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process

Naphthalene derivative, resist bottom layer material, and patterning process

Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process

Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process

Positive resist compositions and patterning process

Polymer, resist composition, and patterning process

Positive resist composition and patterning process

Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

Chemically amplified resist composition and patterning process

Deprotection method of protected polymer

Ester compounds and their preparation, polymers, resist compositions and patterning process

Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition

Photoacid generator, resist composition, and patterning process

Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process

Resist-modifying composition and pattern forming process

Resist-modifying composition and pattern forming process

Pattern forming process and resist-modifying composition

Antireflective coating composition, antireflective coating, and patterning process

Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process

Photoresist undercoat-forming material and patterning process

Carboxyl-containing lactone compound, polymer, resist composition, and patterning process

Photoacid generator, resist composition, and patterning process

Photoacid generator, resist composition, and patterning process

Polymer, polymer preparation method, resist composition and patterning process

Hydroxyl-containing monomer, polymer, resist composition, and patterning process

Positive resist composition and patterning process

Hydrogenated ring-opening metathesis polymer, resist composition and patterning process

Positive resist compositions and patterning process

Positive resist compositions and patterning process

Positive resist compositions and patterning process

Resist composition and patterning process

Photoacid generator, resist composition, and patterning process

Patterning process and pattern surface coating composition

Fluorinated monomer, fluorinated polymer, resist composition and patterning process

Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process

Nitrogen-containing organic compound, resist composition and patterning process

Photoacid generators, resist compositions, and patterning process

Ester compounds and their preparation, polymers, resist compositions and patterning process

Polymerizable ester compounds, polymers, resist compositions and patterning process

Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

Photoresist undercoat-forming material and patterning process

Thermal acid generator, resist undercoat material and patterning process

Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process

Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process

Polymer, resist composition and patterning process

Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

Amine compound, chemically amplified resist composition and patterning process

Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process

Resist protective coating material and patterning process

Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process

Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process

Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process

Polymer, resist composition and patterning process

Nitrogen-containing organic compound, chemically amplified resist composition and patterning process