Koji Ashida

City:

Sanda

Country:

Japan

Published Applications:

Last publication date:

2024-02-08

Top Assignees for applications by Koji Ashida

The entities that hold a legal rights for patent applications filed by inventor Ashida Koji:

Koji Ashida from Sanda, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Method of using sic container

MANUFACTURING DEVICE FOR SIC SEMICONDUCTOR SUBSTRATE

Reference sample with inclined support base, method for evaluating scanning electron microscope, and method for evaluating SiC substrate

Reference sample with inclined support base, method for evaluating scanning electron microscope, and method for evaluating SiC substrate

Vapour-phase epitaxial growth method, and method for producing substrate equipped with epitaxial layer

Method for manufacturing semiconductor wafer

Surface treatment method for SiC substrate

Etching method for SiC substrate and holding container

InventorID:

6044570 ⎘