Daisuke Maruyama

City:

Toyama

Country:

Japan

Published Applications:

Last publication date:

2012-02-23

Top Assignees for applications by Daisuke Maruyama

The entities that hold a legal rights for patent applications filed by inventor Maruyama Daisuke:

Daisuke Maruyama from Toyama, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Pattern reversal film forming composition and method of forming reversed pattern

Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound

Condensation type polymer-containing anti-reflective coating for semiconductor

InventorID:

6046565 ⎘