Dresden
Germany
9
2014-01-09
The entities that hold a legal rights for patent applications filed by inventor Huy Katja:
Katja Huy from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Spacer for a gate electrode having tensile stress and a method of forming the same
#2 | 2007-05-03SEMICONDUCTOR DEVICE COMPRISING COPPER-BASED CONTACT PLUG AND A METHOD OF FORMING THE SAME
#3 | 2007-04-05Method for forming a tungsten interconnect structure with enhanced sidewall coverage of the barrier layer
#4 | 2005-09-22Nitrogen-free ARC layer and a method of manufacturing the same
#5 | 2005-06-30Technique for forming a spacer for a line element by using an etch stop layer deposited by a highly directional deposition technique
#6 | 2005-06-23Spacer for a gate electrode having tensile stress and a method of forming the same
#7 | 2005-03-03Method of forming a TEOS cap layer at low temperature and reduced deposition rate
#8 | 2005-02-03Method of improving the wafer-to-wafer thickness uniformity of silicon nitride layers
#9 | 2005-02-03Technique for forming recessed sidewall spacers for a polysilicon line
605724 ⎘