Hirohiko Nakata

Heating device for manufacturing semiconductor

Semiconductor processing apparatus with a heat resistant hermetically sealed substrate support

Semiconductor or liquid crystal producing device

Substrate processing apparatus

Wafer holder, and wafer prober provided therewith

Holder for use in semiconductor or liquid-crystal manufacturing device and semiconductor or liquid-crystal manufacturing device in which the holder is installed

Ceramic joined body, substrate holding structure and substrate processing apparatus

Heater unit and semiconductor manufacturing apparatus including the same

Body for keeping a wafer, heater unit and wafer prober

Wafer holder and semiconductor manufacturing apparatus

Fluid heating heater

Body for keeping a wafer and wafer prober using the same

Substrate holding structure and substrate processing device

Wafer holder for wafer prober and wafer prober equipped with the same

Temperature gauge and ceramic susceptor in which it is utilized

Connecting structures

Ceramic susceptor for semiconductor manufacturing equipment

Aluminum nitride sintered body

Aluminum nitride sintered body

Semiconductor heating apparatus

Heater module for semiconductor manufacturing equipment

Heater module for semiconductor manufacturing equipment

Ceramic susceptor

Heater and heating device

Semiconductor manufacturing apparatus

Ceramics base plate and method for producing the same

Wafer holder and semiconductor manufacturing apparatus

Ceramic susceptor