Carl Woods

METHOD AND SYSTEM FOR UNIFORMLY APPLYING A MULTI-PHASE CLEANING SOLUTION TO A SUBSTRATE

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Method and system for uniformly applying a multi-phase cleaning solution to a substrate

#3 | 2011-06-09

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Method and system for uniformly applying a multi-phase cleaning solution to a substrate

#4 | 2011-03-29

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Method and apparatus for uniformly applying a multi-phase cleaning solution to a substrate

#5 | 2010-10-12

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Reducing mechanical resonance and improved distribution of fluids in small volume processing of semiconductor materials

#6 | 2010-07-08

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Method and apparatus for plating semiconductor wafers

#7 | 2009-12-31

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Apparatus for plating semiconductor wafers

#8 | 2009-10-22

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Wafer support apparatus for electroplating process and method for using the same

#9 | 2009-06-18

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Methods for transitioning a fluid meniscus to and from surfaces of a substrate

#10 | 2008-11-06

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Apparatus and method for plating semiconductor wafers

#11 | 2008-03-06

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Controlled ambient system for interface engineering

#12 | 2008-01-10

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Substrate proximity processing structures

#13 | 2007-10-11

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Methods for substrate processing in cluster tool configurations having meniscus application systems

#14 | 2007-09-20

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Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces

#15 | 2007-07-10

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System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold

#16 | 2007-06-26

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Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces

#17 | 2007-05-17

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Meniscus proximity system for cleaning semiconductor substrate surfaces

#18 | 2007-04-03

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Meniscus, vacuum, IPA vapor, drying manifold

#19 | 2007-02-01

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Meniscus, vacuum, IPA vapor, drying manifold

#20 | 2007-01-18

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System processing a substrate using dynamic liquid meniscus

#21 | 2007-01-04

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System and method for producing bubble free liquids for nanometer scale semiconductor processing

#22 | 2006-10-31

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Method and apparatus for fluid delivery to a backside of a substrate

#23 | 2006-09-21

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Multi-menisci processing apparatus

#24 | 2006-07-13

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Methods and systems for processing a substrate using a dynamic liquid meniscus

#25 | 2006-07-04

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Vertical proximity processor

#26 | 2006-06-15

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Wafer support apparatus for electroplating process and method for using the same

#27 | 2006-01-24

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Methods and systems for processing a substrate using a dynamic liquid meniscus

#28 | 2005-12-29

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Method and apparatus for plating semiconductor wafers

#29 | 2005-07-21

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Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same

#30 | 2005-07-07

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Substrate proximity processing housing and insert for generating a fluid meniscus

#31 | 2005-07-07

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Substrate meniscus interface and methods for operation

#32 | 2005-06-30

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Proximity meniscus manifold

#33 | 2005-06-23

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