Yusuke Fuji

City:

Ibaraki

Country:

Japan

Published Applications:

Last publication date:

2015-05-14

Top Assignees for applications by Yusuke Fuji

The entities that hold a legal rights for patent applications filed by inventor Fuji Yusuke:

SUMITOMO CHEMICAL COMPANY, LIMITED 10 Tokyo, Japan
SUMITOMO CHEMICAL COMPANY, LIMITED 1 Osaka, Japan

Recent patent applications by Fuji Yusuke

Yusuke Fuji from Ibaraki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2015-05-14

US20150132698A1

Physics

Resin and resist composition

#2 | 2010-12-23

US20100323296A1

Chemistry; metallurgy

Resin and resist composition

#3 | 2009-12-24

US20090317744A1

Chemistry; metallurgy

Polymer and chemically amplified resist composition comprising the same

#4 | 2009-10-29

US20090269695A1

Physics

Chemically amplified positive resist composition

#5 | 2009-10-22

US20090264565A1

Chemistry; metallurgy

Polymer and chemically amplified resist composition comprising the same

#6 | 2009-10-22

US20090263742A1

Physics

Chemically amplified positive resist composition

#7 | 2009-09-03

US20090220890A1

Physics

Chemically amplified resist composition and chemically amplified resist composition for immersion lithography

#8 | 2008-11-06

US20080274426A1

Physics

Chemically amplified resist composition

#9 | 2007-09-20

US20070218401A1

Physics

Chemically amplified positive resist composition

#10 | 2005-05-12

US20050100819A1

Physics

Chemical amplification type positive resist composition and a resin therefor

InventorID:

6097948 ⎘