Yoshitaka Hamada

Formation of conductive circuit, conductive circuit, and conductive ink composition

#2 | 2012-07-19

US20120184674A1

Silicone resin composition and optical material

#3 | 2011-07-21

US20110178322A1

Preparation process of trisilylamine

#4 | 2010-06-03

US20100137626A1

Organic silane compound for forming Si-containing film by plasma CVD and method for forming Si-containing film

#5 | 2010-02-18

US20100040895A1

High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device

#6 | 2010-02-18

US20100040893A1

Substrate joining method and 3-D semiconductor device

#7 | 2009-02-26

US20090053906A1

Semiconductor device producing method and substrate processing apparatus

#8 | 2008-12-18

US20080311514A1

Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing

#9 | 2008-11-27

US20080290521A1

Method for forming insulating film with low dielectric constant

#10 | 2008-10-09

US20080248280A1

Process for preparing a dispersion liquid of zeolite fine particles

#11 | 2007-08-16

US20070190457A1

Resist composition and patterning process using the same

#12 | 2007-01-11

US20070009832A1

Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process

#13 | 2006-10-05

US20060224009A1

Silsesquioxane compound mixture, method of making, resist composition, and patterning process

#14 | 2006-02-23

US20060040206A1

Resist composition and patterning process

#15 | 2005-12-15

US20050277756A1

Porous film-forming composition, patterning process, and porous sacrificial film

#16 | 2005-12-15

US20050277755A1

Sacrificial film-forming composition, patterning process, sacrificial film and removal method

#17 | 2005-12-15

US20050277058A1

Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same

#18 | 2005-12-15

US20050274692A1