Joetsu
Japan
11
2013-05-23
The entities that hold a legal rights for patent applications filed by inventor Koitabashi Ryuji:
Ryuji Koitabashi from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Light pattern exposure method, photomask, and photomask blank
#2 | 2013-05-23Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank
#3 | 2012-10-04Photomask blank and method for manufacturing photomask
#4 | 2012-03-15Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film
#5 | 2011-12-01Photomask blank, resist pattern forming process, and photomask preparation process
#6 | 2011-07-21Chemically amplified negative resist composition and patterning process
#7 | 2010-09-30Photomask blank, processing method, and etching method
#8 | 2008-11-06Preparation process of chemically amplified resist composition
#9 | 2008-04-24Resist composition and patterning process
#10 | 2007-02-15Chemically amplified positive resist composition and patterning process
#11 | 2005-10-20Chemically amplified positive resist composition and patterning process
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