Inventor profile of:

Hiroki Yoshikawa

City:

Joetsu

Country:

Japan

Published Applications:

27

Last publication date:

2013-05-23

Top Assignees for applications by Hiroki Yoshikawa

The entities that hold a legal rights for patent applications filed by inventor Yoshikawa Hiroki:

Recent patent applications by Yoshikawa Hiroki

Hiroki Yoshikawa from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2013-05-23
US20130130160A1
Physics

Light pattern exposure method, photomask, and photomask blank

#2 | 2013-05-23
US20130130159A1
Physics

Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank

#3 | 2013-05-23
US20130126471A1
Physics

Evaluation of etching conditions for pattern-forming film

#4 | 2013-03-07
US20130059235A1
Physics

Photomask blank, photomask, and making method

#5 | 2012-10-04
US20120251930A1
Physics

Photomask blank and method for manufacturing photomask

#6 | 2012-03-15
US20120064438A1
Physics

Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film

#7 | 2012-02-09
US20120034551A1
Physics

Binary photomask blank and binary photomask making method

#8 | 2010-12-16
US20100316942A1
Physics

Photomask making method

#9 | 2010-11-18
US20100291478A1
Physics

Etching method and photomask blank processing method

#10 | 2010-10-14
US20100261101A1
Physics

Photomask blank and photomask

#11 | 2010-10-14
US20100261100A1
Physics

Photomask blank and photomask

#12 | 2010-10-14
US20100261099A1
Physics

Photomask blank and photomask making method

#13 | 2010-09-30
US20100248091A1
Physics

Method for inspecting photomask blank or intermediate thereof, method for determining dosage of high-energy radiation, and method for manufacturing photomask blank

#14 | 2010-09-30
US20100248090A1
Physics

Photomask blank and photomask

#15 | 2010-09-30
US20100246932A1
Physics

Method for inspecting and judging photomask blank or intermediate thereof

#16 | 2010-06-10
US20100143831A1
Physics

Photomask blank and photomask

#17 | 2008-03-13
US20080063950A1
Physics

Photomask blank and photomask

#18 | 2007-10-25
US20070248897A1
Physics

Photomask blank

#19 | 2007-09-13
US20070212619A1
Physics

Photomask blank and photomask making method

#20 | 2007-09-13
US20070212618A1
Physics

Photomask blank and photomask

#21 | 2006-08-10
US20060177746A1
Physics

Half-tone stacked film, photomask-blank, photomask and fabrication method thereof

#22 | 2006-04-27
US20060088774A1
Physics

Photomask blank, photomask and fabrication method thereof

#23 | 2005-11-24
US20050260505A1
Physics

Preparation of photomask blank and photomask

#24 | 2005-11-03
US20050244722A1
Physics

Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method

#25 | 2005-10-06
US20050217988A1
Physics

Film-depositing target and preparation of phase shift mask blank

#26 | 2005-08-25
US20050186487A1
Physics

Halftone phase shift mask blank, halftone phase shift mask and their preparation

#27 | 2005-08-25
US20050186485A1
Physics

Preparation of halftone phase shift mask blank

InventorID:

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