Joetsu
Japan
22
2011-02-10
The entities that hold a legal rights for patent applications filed by inventor Nishi Tsunehiro:
Tsunehiro Nishi from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition
#2 | 2010-12-09Positive resist compositions and patterning process
#3 | 2010-11-25Resist-modifying composition and pattern forming process
#4 | 2010-11-25Resist-modifying composition and pattern forming process
#5 | 2010-08-19Pattern forming process and resist-modifying composition
#6 | 2010-06-03Acetal compounds and their preparation, polymers, resist compositions and patterning process
#7 | 2010-03-11Double patterning process
#8 | 2010-03-11Positive resist composition and patterning process
#9 | 2009-11-05Carboxyl-containing lactone compound, polymer, resist composition, and patterning process
#10 | 2009-09-17Lactone-containing compound, polymer, resist composition, and patterning process
#11 | 2009-08-20Double patterning process
#12 | 2009-02-05Fluorinated monomer, fluorinated polymer, resist composition and patterning process
#13 | 2008-10-30Positive resist compositions and patterning process
#14 | 2008-10-16Positive resist composition and patterning process
#15 | 2008-05-29Positive resist compositions and patterning process
#16 | 2008-05-29Positive resist composition and patterning process
#17 | 2008-01-10Positive resist compositions and patterning process
#18 | 2008-01-10Positive resist compositions and patterning process
#19 | 2008-01-10Positive resist compositions and patterning process
#20 | 2007-08-02Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
#21 | 2007-06-28Polymers, resist compositions and patterning process
#22 | 2005-12-22Polymer, resist composition and patterning process
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