Sodegaura
Japan
40
2017-09-14
The entities that hold a legal rights for patent applications filed by inventor Yano Koki:
Koki Yano from Sodegaura, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Oxide semiconductor substrate and schottky barrier diode
#2 | 2016-07-21Oxide semiconductor substrate and schottky barrier diode
#3 | 2016-07-07Oxide semiconductor substrate and schottky barrier diode
#4 | 2014-05-29Sputtering target
#5 | 2014-04-17InO—SnO—ZnO sputtering target
#6 | 2014-03-27Sputtering target comprising an oxide sintered body comprising In, Ga, and Zn
#7 | 2014-01-16Sintered material, and process for producing same
#8 | 2013-11-28Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistor
#9 | 2013-08-29Laminate structure including oxide semiconductor thin film layer, and thin film transistor
#10 | 2013-05-16Sputtering target, transparent conductive film and transparent electrode
#11 | 2013-05-09Composite oxide sintered body and sputtering target comprising same
#12 | 2013-04-25Sputtering target, transparent conductive film and transparent electrode
#13 | 2013-04-04Sintered oxide body, target comprising the same, and oxide semiconductor thin film
#14 | 2012-12-13In-Ga-Sn oxide sinter, target, oxide semiconductor film, and semiconductor element
#15 | 2012-09-13Sputtering target and thin film transistor equipped with same
#16 | 2012-05-17In—Ga—Zn—O type sputtering target
#17 | 2012-01-12TFT substrate and method for producing TFT substrate
#18 | 2011-12-29Sputtering target, oxide semiconductor film and semiconductor device
#19 | 2011-10-27Composite oxide sintered body and sputtering target comprising same
#20 | 2011-08-18Thin film transistor having a crystalline semiconductor film including indium oxide which contains a hydrogen element and method for manufacturing same
#21 | 2011-07-28Sputtering target for oxide semiconductor, comprising InGaO3(ZnO) crystal phase and process for producing the sputtering target
#22 | 2011-07-21Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistor
#23 | 2011-07-14Sputtering target for oxide thin film and process for producing the sputtering target
#24 | 2011-05-26Sputtering target, transparent conductive film and transparent electrode
#25 | 2011-03-03Field effect transistor, semiconductor device and semiconductor device manufacturing method
#26 | 2010-11-11TFT substrate and method for manufacturing TFT substrate
#27 | 2010-11-11TFT substrate and TFT substrate manufacturing method
#28 | 2010-10-21Oxide material and sputtering target
#29 | 2010-07-08Sputtering target, transparent conductive film and transparent electrode
#30 | 2010-07-01Semiconductor thin film, method for manufacturing the same, thin film transistor, and active-matrix-driven display panel
#31 | 2010-05-27TFT substrate and method for manufacturing TFT substrate
#32 | 2010-03-18Thin film transistor having crystalline indium oxide semiconductor film
#33 | 2009-12-17Sputtering target, transparent conductive film, and transparent electrode for touch panel
#34 | 2009-10-29Semiconductor thin film and method for manufacturing same, and thin film transistor
#35 | 2009-10-08Amorphous transparent conductive film, target and production method for amorphous conductive film
#36 | 2009-05-21Semiconductor thin film and process for producing the same
#37 | 2009-05-14In Sm oxide sputtering target
#38 | 2009-03-19Modified polyolefin resin for glass fiber treatment, surface-treated glass fiber, and fiber-reinforced polyolefin resin
#39 | 2008-08-21Semiconductor, semiconductor device, complementary transistor circuit device
#40 | 2007-10-04Method for producing fiber-reinforced resin composition
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