Joetsu
Japan
14
2022-12-22
The entities that hold a legal rights for patent applications filed by inventor Funatsu Kenji:
Kenji Funatsu from Joetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
CHEMICALLY AMPLIFIED RESIST COMPOSITION, PHOTOMASK BLANK, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING POLYMER COMPOUND
#2 | 2022-08-18Negative resist composition and pattern forming process
#3 | 2017-08-10Polymer, resist composition, and pattern forming process
#4 | 2017-04-06Method for producing polymer
#5 | 2016-11-10Positive resist composition and patterning process
#6 | 2016-05-05Pattern forming process and shrink agent
#7 | 2014-07-31Patterning process and resist composition
#8 | 2014-06-26Resist composition, patterning process and polymer
#9 | 2014-03-06Resist composition and patterning process
#10 | 2014-03-06Resist composition and patterning process
#11 | 2014-01-09Patterning process and resist composition
#12 | 2013-05-23Negative pattern forming process
#13 | 2012-05-03Pattern forming process
#14 | 2007-06-28Polymers, resist compositions and patterning process
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