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Inventor profile of:

Tetsuya Endo

City:

Komae

Country:

Japan

Published Applications:

Last publication date:

2015-08-20

Top Assignees for applications by Tetsuya Endo

The entities that hold a legal rights for patent applications filed by inventor Endo Tetsuya:

CANON ANELVA CORPORATION 11 Kawasaki-shi, Japan
CANON ANELVA CORPORATION 1 Kanagawa-ken, Japan
CANON ANELVA CORPORATION 1 Kawasaki-shi, Kanagawa-ken, Japan

Recent patent applications by Endo Tetsuya

Tetsuya Endo from Komae, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2015-08-20

US20150235751A1

Electricity

Magnet unit and magnetron sputtering apparatus

#2 | 2012-06-28

US20120160673A1

Electricity

Magnet unit and magnetron sputtering apparatus

#3 | 2012-06-28

US20120160672A1

Electricity

Sputtering apparatus

#4 | 2012-03-22

US20120070693A1

Electricity

Magnetic sensor stack body, method of forming the same, film formation control program, and recording medium

#5 | 2011-12-08

US20110297537A1

Electricity

Magnet unit and magnetron sputtering apparatus

#6 | 2011-11-10

US20110272278A1

Chemistry; metallurgy

Sputtering apparatus

#7 | 2011-07-28

US20110180401A1

Chemistry; metallurgy

Magnet unit and magnetron sputtering apparatus

#8 | 2011-06-30

US20110155569A1

Electricity

Cooling system

#9 | 2011-02-10

US20110032645A1

Physics

Magnetic sensor stack body, method of forming the same, film formation control program, and recording medium

#10 | 2010-06-24

US20100155229A1

Chemistry; metallurgy

Sputtering apparatus and film deposition method

#11 | 2009-09-24

US20090236219A1

Chemistry; metallurgy

Magnetron unit, magnetron sputtering apparatus, and method of manufacturing electronic device

InventorID:

6196256 ⎘