Plano, Texas
United States
14
2017-08-03
The entities that hold a legal rights for patent applications filed by inventor Lii Tom:
Tom Lii from Plano, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Dielectric liner added after contact etch before silicide formation
#2 | 2016-11-24Uniform, damage free nitride ETCH
#3 | 2016-10-20Spacer shaper formation with conformal dielectric film for void free PMD gap fill
#4 | 2015-10-08Spacer shaper formation with conformal dielectric film for void free PMD gap fill
#5 | 2015-10-08Dielectric liner added after contact etch before silicide formation
#6 | 2015-07-02DUAL LAYER HARDMASK FOR EMBEDDED EPI GROWTH
#7 | 2015-02-12Hard mask for source/drain epitaxy control
#8 | 2014-12-11Dielectric liner added after contact etch before silicide formation
#9 | 2014-08-14Method of forming a metal contact opening with a width that is smaller than the minimum feature size of a photolithographically-defined opening
#10 | 2014-07-03Replacement gate process
#11 | 2014-07-03Uniform, damage free nitride etch
#12 | 2014-01-23Spacer shaper formation with conformal dielectric film for void free PMD gap fill
#13 | 2012-04-26TRENCH LITHOGRAPHY PROCESS
#14 | 2012-03-15Lateral uniformity in silicon recess etch
619770 ⎘