Aalen
Germany
24
2020-01-02
The entities that hold a legal rights for patent applications filed by inventor Haidner Helmut:
Helmut Haidner from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Measurement apparatus for measuring a wavefront aberration of an imaging optical system
#2 | 2018-07-12Projection exposure apparatus and method for measuring an imaging aberration
#3 | 2016-07-14Apparatus for determining an optical property of an optical imaging system
#4 | 2015-01-08Measuring system for measuring an imaging quality of an EUV lens
#5 | 2014-05-01Measuring system
#6 | 2014-01-23Device and method for the optical measurement of an optical system by using an immersion fluid
#7 | 2012-05-10DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM BY USING AN IMMERSION FLUID
#8 | 2009-10-15Device and method for the optical measurement of an optical system by using an immersion fluid
#9 | 2009-01-22DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM BY USING AN IMMERSION FLUID
#10 | 2008-09-25Device and method for the interferometric measurement of phase masks
#11 | 2008-09-25Methods and apparatus for measuring wavefronts and for determining scattered light, and related devices and manufacturing methods
#12 | 2008-06-19APPARATUS FOR WAVEFRONT DETECTION
#13 | 2008-06-05DEVICE AND METHOD FOR THE DETERMINATION OF IMAGING ERRORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEM
#14 | 2008-02-26Apparatus and method for measuring the wavefront of an optical system
#15 | 2008-02-19Apparatus for wavefront detection
#16 | 2008-02-14METHOD AND APPARATUS FOR DETERMINING THE INFLUENCING OF THE STATE OF POLARIZATION BY AN OPTICAL SYSTEM, AND AN ANALYSER
#17 | 2007-10-23Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser
#18 | 2007-03-01INTERFEROMETRIC MEASURING DEVICE AND PROJECTION EXPOSURE INSTALLATION COMPRISING SUCH MEASURING DEVICE
#19 | 2006-06-29Method of manufacturing a miniaturized device
#20 | 2006-05-25Diffuser, wavefront source, wavefront sensor and projection exposure apparatus
#21 | 2005-12-01Interferometric measuring device and projection exposure installation comprising such measuring device
#22 | 2005-11-03Device and method for the optical measurement of an optical system by using an immersion fluid
#23 | 2005-09-01Device and method for the determination of imaging errors and microlithography projection exposure system
#24 | 2005-01-13Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry
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