Inventor profile of:

Timo Malinen

City:

Espoo

Country:

Finland

Published Applications:

15

Last publication date:

2023-06-22

Top Assignees for applications by Timo Malinen

The entities that hold a legal rights for patent applications filed by inventor Malinen Timo:

Recent patent applications by Malinen Timo

Timo Malinen from Espoo, FI has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2023-06-22
US20230193461A1
Chemistry; metallurgy

Method of operating a deposition or cleaning apparatus

#2 | 2023-03-23
US20230090809A1
Chemistry; metallurgy

Adjustable fluid inlet assembly for a substrate processing apparatus and method

#3 | 2021-06-24
US20210189560A1
Chemistry; metallurgy

Adjustable fluid inlet assembly for a substrate processing apparatus and method

#4 | 2021-03-25
US20210087687A1
Chemistry; metallurgy

UNIFORM DEPOSITION

#5 | 2019-12-26
US20190390339A1
Chemistry; metallurgy

Deposition or cleaning apparatus with movable structure

#6 | 2019-06-27
US20190194809A1
Chemistry; metallurgy

APPARATUS AND METHODS FOR ATOMIC LAYER DEPOSITION

#7 | 2018-04-12
US20180099304A1
Performing operations; transporting

Atomic Layer Deposition with Plasma Source

#8 | 2017-11-30
US20170342563A1
Chemistry; metallurgy

ALD method and apparatus including a photon source

#9 | 2017-11-30
US20170342560A1
Chemistry; metallurgy

ALD method and apparatus

#10 | 2017-03-16
US20170073807A1
Chemistry; metallurgy

Protecting an interior of a hollow body with an ALD coating

#11 | 2016-05-19
US20160138163A1
Chemistry; metallurgy

Method and apparatus for forming a substrate web track in an atomic layer deposition reactor

#12 | 2016-03-17
US20160076148A1
Chemistry; metallurgy

Protecting a target pump interior with an ALD coating

#13 | 2015-11-12
US20150322569A1
Chemistry; metallurgy

Atomic layer deposition with plasma source

#14 | 2014-03-27
US20140087093A1
Chemistry; metallurgy

Deposition reactor with plasma source

#15 | 2014-01-23
US20140024223A1
Performing operations; transporting

Atomic layer deposition with plasma source

InventorID:

623045 ⎘