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Inventor profile of:

Masashi Kasami

City:

Sodegaura

Country:

Japan

Published Applications:

7

Last publication date:

2014-05-29

Top Assignees for applications by Masashi Kasami

The entities that hold a legal rights for patent applications filed by inventor Kasami Masashi:

IDEMITSU KOSAN CO., LTD. 7 Tokyo, Japan
IDEMITSU KOSAN CO., LTD. 1 Ciyoda-ku, Tokyo, Japan

Recent patent applications by Kasami Masashi

Masashi Kasami from Sodegaura, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2014-05-29

US20140145124A1

Chemistry; metallurgy

In—Ga—Zn oxide sputtering target and method for producing same

#2 | 2014-04-17

US20140103268A1

InO—SnO—ZnO sputtering target

#3 | 2014-03-27

US20140084289A1

Sputtering target comprising an oxide sintered body comprising In, Ga, and Zn

#4 | 2012-12-13

US20120313057A1

Chemistry; metallurgy

In-Ga-Sn oxide sinter, target, oxide semiconductor film, and semiconductor element

#5 | 2011-12-29

US20110315936A1

Chemistry; metallurgy

Sputtering target, oxide semiconductor film and semiconductor device

#6 | 2011-08-18

US20110198586A1

Thin film transistor having a crystalline semiconductor film including indium oxide which contains a hydrogen element and method for manufacturing same

#7 | 2010-03-18

US20100065835A1

Thin film transistor having crystalline indium oxide semiconductor film

InventorID:

6273261 ⎘