Xiaowei Wang

City:

Kakegawa

Country:

Japan

Published Applications:

Last publication date:

2018-11-15

Top Assignees for applications by Xiaowei Wang

The entities that hold a legal rights for patent applications filed by inventor Wang Xiaowei:

Xiaowei Wang from Kakegawa, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Composition for forming fine resist pattern and pattern forming method using same

Top-layer membrane formation composition and method for forming resist pattern using same

Composition for forming topcoat layer and resist pattern formation method employing the same

Resist pattern formating method

InventorID:

6310619 ⎘