Toyama
Japan
8
2015-09-03
The entities that hold a legal rights for patent applications filed by inventor Ho BangChing:
BangChing Ho from Toyama, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same
#2 | 2015-03-19Silicon-containing EUV resist underlayer film-forming composition including additive
#3 | 2014-06-19Resist underlayer film-forming composition for EUV lithography containing condensation polymer
#4 | 2014-04-10Composition for forming resist underlayer film for EUV lithography
#5 | 2014-02-06Polymer-containing developer
#6 | 2013-09-05Resist underlayer film forming composition, and method for forming resist pattern using the same
#7 | 2013-08-15Composition for forming resist overlayer film for EUV lithography
#8 | 2011-09-22Composition for forming resist underlayer film with reduced outgassing
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